Electrochemical micromachining of micro-dimple arrays on cylindrical inner surfaces using a dry-film photoresist

The application of surface textures has been employed to improve the tribological performance of various mechanical components. Various techniques have been used for the application of surface textures such as micro-dimple arrays, but the fabrication of such arrays on cylindrical inner surfaces remains a challenge. In this study, a dry-film photoresist is used as a mask during through-mask electrochemical micromachining to successfully prepare micro-dimple arrays with dimples 94 lm in diameter and 22.7 lm deep on cylindrical inner surfaces, with a machining time of 9 s and an applied voltage of 8 V. The versatility of this method is demonstrated, as are its potential low cost and high efficiency. It is also shown that for a fixed dimple depth, a smaller dimple diameter can be obtained using a combination of lower current density and longer machining time in a passivating sodium nitrate electrolyte.     

用于PolyStrata技术的光刻工艺探索研究

在高集成的射频微机电系统RF MEMS（Radio Frequency Micro Electro Mechanical System）器件的发展趋势下，三维集成工艺的研究越来越多。基于PolyStrata技术的三维多层堆叠同轴器件以其无色散、低损耗、超宽带的优势脱颖而出，PolyStrata技术使用紫外厚胶作为牺牲材料，对光刻胶粘附性、精度、工艺兼容及释放性能要求高，常规厚胶难以满足。探索A、B两种紫外光刻厚胶，对两者工艺参数及图形质量进行对比研究。结果表明，光刻胶A厚度均匀性为98.6%，图形偏差小于10μm；光刻胶B图形偏差小于5μm，但均匀性较差，约80.4%。